The CM-200/210 are highly precise hydrofluoric acid monitors that were developed to monitor hydrofluoric acid resulting from the manufacture of semiconductors. The devices measure the concentration of hydrofluoric acid through the use of electromagnetic induction conductivity meters and display measurement results in real time. The CM-200/210 are prevalently used in the production process, which uses hydrofluoric acid in such processes as the washing of etched wafers.

The device has an range of error of less than ±2%F.S. within the low range of 0wt% to 1wt% and is optimally suited to determine degree and region of concentration in a memory production line.

The submersible sensor is completely covered by a PFA resin mold so there is no risk of metal corrosion with the hydrofluoric acid.

In order to reliably manage the process, the device is equipped with various kinds of warning systems.

The CM-200 has a submersible-type sensor, and the CM-210 has a flow-type sensor.