The HORIBA CS-100F1 Series chemical solution concentration monitors take straight aim at the need for highly accurate concentration monitoring of chemical solutions used in the etching and cleaning processes during semiconductor manufacturing. It offers real-time, inline measurement by directly integrating the sample cell into the cleaning system piping and by using fiber optic cable for light signal transmission. A single concentration monitor can be used to measure up to four types of chemical solutions or ranges and single-line monitoring of multiple chemical solutions in single-bath/single-wafer cleaning systems is possible. Also, a cell unit type is available with feedback concentration control for applications that demand higher accuracy.