Semiconductor Manufacturing Process Monitor

• DIGILEM-CPM-Xe
Al₂O₃/Altic etching




• LEM-CT




• LEM-CT-670-G50
Nb/Au interface detection




• DigiCPM_J
AC POLYSTRIP




• DigiCPM_J
Dual damascene

Step 1: Descum Step 2: SiO2 etch (C4F8, C2F6, Ar, 60 s) : step 2 is monitored Step 3 to 6: Strip (O2...) Step 7: Nitride etch (CHF3, O2, Ar, 38 s) : step 7 is monitored