FPDs (Flat Panel Displays) play a vital role in various information equipment and devices, hardware that supports IT. As such, FPD production processes are evolving rapidly which is reflected in a growing need or high-grade evaluation and analysis of a wide range of thin films. We have developed the FF-1000, a full automatic ultra thin film analyzer, by combining the Spectroscopic Ellipsometry of HORIBA JOBIN YVON with HORIBA's proprietary full automatic wafer measurement technology. This new system is capable of measuring the thickness and optical constants of thin films on various glass substrates at high speed and precision. Besides handling 5th generation large glass substrates 1m square or larger, it also supports production processes for next generation FPDs such as low-temperature polysilicon in TFT (Thin Film Transistors) and organic EL (Organic Electro Luminescence) processes. As a result, the FF-1000 will greatly contribute to the further growth and technological innovation of FPDs.

Compatible with low-temperature polysilicon in TFTs, organic EL and Other next-generation FPD processes.
The system is compatible with production processes for next-generation FPDs including low-temperature polysilicon in TFTs and organic EL, an area of high-potential technical growth.

Measurement of 5th generation large glass substrates
The system supports the measurement of various substrates sizes including 5th generation large glass substrates 1110 x 1250 mm.
* Please consult us separately regarding larger sizes.

PEM element without mechanical vibration obtains fast and accurate measurement
Unlike other systems, HORIBA JOBIN YVON's Spectroscopic Ellipsometer uses phase modulation based on the PEM element. This enables fast and highly accurate measurements, characterized by limited susceptibility to the effects of light, as well as the complete absence of mechanical vibration.

Measurement of ultra-thin films of 1 nm or multi-layer films for TFT
The system allows thin film measurement and data analysis over a broad range of wavelengths, short-wave to long-wave applications, from 190 nm to 830 nm (typical: 248 nm to 830 nm).

Two measurement modes for fast (100 ms) and highly sensitive measurement
Two measurement modes, black-and-white and high-speed measurement modes, are provided. The black-and-white measurement mode allows high-grade evaluation, while the high-speed measurement mode uses a multi-wavelength simultaneous measurement unit to enable measurements of high sensitivity and a minimum measurement time of 100 ms.

Engineer and operator modes
Two modes, engineer mode and operator mode, are provided for system setup. The engineer mode allows detailed setup for high-grade analysis, while the operator mode enables normal operation for operators with minimum skills and experience.

Software enables fully automated analysis of complex and multilayer films
The system is equipped with software for fully automated measurement and analysis of not only film thickness but also optical constants and thickness uniformity for each layer.

Highly accurate pattern recognition enables continuous measurement
The system is equipped with a highly accurate pattern recognition function, designed for fully automated evaluation at measuring points.

Compatible with the latest automated lines
This system is LAN-compatible and fully integratable with AGVs, CIMs and the very latest automated lines.