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FTIR Gas Analyzer
FG-100A Series
Typical measurement results
Gas spectrum immediately after replacement of
Pb(C11H19O2)2 source bottle
Gas concentration monitoring immediately after
replacement of Pb(C11H19O2)2 source bottle
*Extend Abstract (The 49th Spring Meeting, 2002), The Japan Society of Applied Physics (Tokyo Institute of Technology, HORIBA, Ltd.) |
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Analysis of CVD chamber cleaning exhaust gas
Samples are taken from the CVD chamber exhaust line (decompression line). A gas concentration monitor can be used to determine the endpoint of chamber cleaning. Throughput can be increased and gas consumption decreased by optimizing chamber cleaning conditions.
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Dry etching gas evaluation (C2F6)
Abatement system (Plasma method) exhaust gas evaluation
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