Applying infrared beam gas analyzer technology developed for environmental measurement, the IR-150 in-line gas monitor was developed for the measurement of automotive emissions gases and the density of input gases in the semiconductor manufacturing process. In particular, this device is suited to the measurement-using the bubbling method to supply a line of vaporized gas-of density the trimethyl aluminum, trimethyl gallium, and trimethlyl indium used as liquid inputs to MO-CVD. The devices analyzes the trichloro silan used in silicon epitaxial growth in a similar manner.

The in-line method enables real-time measurement of gas density.

Equipped with the safe detection safety system (SDSS), the IR-100 supports the development of fully automated wafer fabrication in the coming 300mm geometries.

The system includes alarms that signal density, pressure, and alarm output.

It has a very small footprint for a measurement device of this type and is easily integrated into gas supply lines for semiconductor fabrication.