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Use environment, application, advantages
Optimal concentration management for liquid and solid material line for MOCVD use We have realized all purpose MFC standard handling and value.
Use Environment
The GaAs device has been expanded to focus towards mobiles phones, satellite broadcasting, satellite communication gas, communication between atmospheric base stations, high speed networks, and furthermore has prospects for expansion in milli- wave area applications. Applications have rapidly expanded to include light devices, CDs and MDs, semiconductor lasers for DVC use, and more. Epitaxial growth from MOCVD, MBE, and others has become normal for compound semiconductor circuit element manufacturing.
Application
MOCVD, MOVPE, and others use TMAI, TMGa, TMlN, DEZ, and other solid and liquid material inside the cylinder to warm and vaporize and supply to the use point. The material gas warmed inside the cylinder can change the cylinder temperature and pressure and, in addition, according to the quantity of material remaining, can also change the concentration. The film variations are a great influence on the element characteristics. In order to reduce that influence the material concentration stability is also an important factor and concentration monitoring is important.
The need for in-line gas monitors The increase in liquid materials in the semiconductor manufacturing process
From the liquid material gas carrier gas capacity control there is direct gasfication supply. The bubbling supply steam pressure change can change the supply concentration.
The need for a real time concentration monitor of the generated gas The demand for concentration feedback control
Advantages
Real time concentration measurement is possible in the original position. The equipment is compact and mount free so installation space does not need to be selected. Offers optimal production line concentration management with outstanding cost performance.
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