IPA (IsoPropyl Alcohol) is widely used in the drying processes required for effective wet cleaning during semiconductor manufacturing. In the past few years, as wafer sizes and circuit miniaturization have increased, more and more attention has been focused on improving productivity through the proper monitoring and control of IPA gas concentration during different IPA drying processes, while using a range of cleaning and CMP equipment. HORIBA has used its gas analysis technology
and its cleaning process experience - which has been honed through the development and production of chemical solution concentration monitors such as the SC-1 and SC-2, mass flow controllers, and a variety of fluid supply systems - to develop a new IPA gas concentration monitor. This IPA gas concentration monitor completes HORIBA's wet cleaning process density control lineup, and makes it possible for the company to offer total wet cleaning process solutions that meet all its customers needs.
The IPA gas concentration monitor can be combined with a mass flow controller or vaporizer, and is perfect for use in combination with a vaporizer or bubbler as a secondary gas concentration monitor.
