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Reticle/Mask Particle Detection System
PR-PD2
Technical literature
Corresponds to 300 mm generation and system LSI manufacture and shows a big influence on the yield improvement Reticle and mask contaminant inspection equipment
This equipment detects contaminants with high sensitivity on the reticle and mask that are for exposure to light. Then the location is displayed specifically with high precision on the screen. This equipment uses argon for the laser scattering method which makes it possible to detect and measure over 90% of the contaminants as small as 0.35. In addition the substantial multistage sorter and communication functions support all varieties of mask cases. They can be adapted to any semiconductor manufacturing line configuration.
Inspection Principle
The system detects particles by analyzing the scattering of laser light when the laser hits them. Evaluation of the scattered light enables detection of the size and location of the particles. The surface undergoing inspection is scanned by laser beams via spinning galvanometer mirrors and detectors measure the amount of light coming off the surface. An exclusive low-pass filter developed by HORIBA is used to analyze signal data for light reflected from the patterned surface and light scattered by particle contaminants. This improves discrimination. Argon lasers (488 nm) are used to increase operation reliability even further.
Advantages
*Detecting contaminants of 0.35 µm
Using the laser scattering method and Ar lasers 0.35 µm contaminants can be detected.
*High stability
The light source fluctuation influence can be offset by reference measurements at a fixed cycle.
*High discrimination rate
From the low pass filter contaminants and pattern discrimination rates are substantially improved. Phase shift masks (half tone masks), OPC masks and more can be inspected.
*Multistage sorters supported
The configuration supports all mask cases. A maximum of 10 stages of multistage sorters can be supported.
*Full communication functions
The communication system uses Microsoft Windows NT as the operating system to improve the ease of operation and also supports SECS and GEM host communications.
*On the spot observation
Optical observation is better for contaminants than microscopes. With optical observation the contaminant situation can be observed on the spot.
Low Pass Filter Discrimination Principles
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(a)former signals |
(b)low pass filter characteristics |
(c)differential output |
Low pass filter effects
(test pattern) |
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(a) |
(b) |
(c) |
(output signal) |
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(a) |
(b) |
(c) |
Main specifications
Inspection objects |
with pericle (without) reticle, mask |
Board sizes: |
5, 6, 7 inches (9 inches is optional), thickness: 2.3 to 6.3 mm |
Detection capacity |
attern surface 0.35µm (Detection rate of over 90%)
Glass surface 5.0µm (Detection rate of over 90%)
pericle surface (Detection rate of over 90%) |
Inspection time |
approximately 13 minutes (4 surface inspection) |
Micromirror observation |
pattern surface (approximately 220 times, approximately 440 times, approximately 1100 times change possible)
Glass surface (approximately 40 times fixed) |
External dimensions |
1710 mm (W) x 1260 mm (D) x 1540 (H) |
Setup area |
2710mm(W) x 2195mm(D) |
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Reticle 4 surface inspection results |
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(PR-PD2 (American market) Semiconductor System Planning Development Department HORIBA Manufacturing Works) (PD-5000 (Japanese Market) Equipment Section Number One, Electronic Device Manufacturing System Propulsion Head Office, Hitachi Ltd.) |
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