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PR-PD2
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Reticle/Mask Particle Detection System

PR-PD2

Ultrasensitive detection down to 0.35 µm


Outline
Efficiently provides particle detection with high throughput
In semiconductor plants, where high performance and demanding functionality are required, the HORIBA PD Series' high operating rate and long-term dependability have earned it a solid reputation. Inheriting a transfer system that has proven to provide stable, high performance and superior throughput over long operating periods, the PR-PD2 now offers the most sensitive detection in the series with exclusive signal processing that can detect particles as small as 0.35 µm.
Compatible with any stepper case, the PR-PD2 features a multi-stage sorter that can handle up to 10 cassettes and supports all communication protocols. True to its colors as a member of the PD Series it boasts high capability over a broad range of general reticle and mask particle detection tasks, and goes on by being able to evaluate glass or pellicle surfaces with high throughput. The PR-PD2 will prove its worth by contributing to yield improvements in any semiconductor fabrication facility.

Main Features
0.35 µm detection sensitivity, 93% detection rate.

Easy operation with flexible insptection menue.

Automatic loading of up to 10 reticles directly from reticle cases in a multi-stage sorter.

It is possible to obtain direct observations from both the reticle and mask surfaces (glass surface and pattern surface.)

Particles mapped on MS Windows NT, convenient data management for reporting.

Reduce inspection errors using the New Signal Process Method.

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