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Reticle/Mask Particle Detection System
PR-PD2
Use Environment
Microcontaminants on the pattern can be detected as small as 0.35µm. Detection errors can be reduced to a minimum from a special function of the reticle mask width of 1.5µm and the line spacing pattern of 1.5µm.
Applications
Reticle and mask fabrication processes
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Measurement of particles on masks and reticle blanks. |
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Measurement of particles on pattern and glass surfaces after EB lithography and cleaning processes. |
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Measurement of particles on pattern, glass and pellicle surfaces after pellicle attachment. |
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Measurement of particles on pellicle, alone, before attachment (optional function) |
Exposure process
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In-coming QA inspection of reticles and masks. |
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Routine particle measurement of reticles and masks before exposure. |
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Periodic particle measurement of reticles and masks. |
Advantage
Can detect particles as small as 0.35 µm |
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Use of exclusive signal processing to evaluate laser scattering enables detection of contaminant particles as small as 0.35 µm. Pattern discrimination of 1 µm line and space on the reticle or mask means that erroneous detection is minimized. |
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Multi-stage sorter handles any kind of stepper case
As well as any kind of stepper case, the ten-stage sorter can also handle SMIF pods. A mix of different-sized stepper cases from different makers can be loaded.
Easy operation DMS
Evaluation procedures are simple because the user can specify all inspection conditions including reticle size, inspection configuration, inspection area on surface, particle levels, and many others as well. Results are displayed in real time as they are detected in a matrix display that maps where particles are found on the substrate and indicates their size. Inspection results are stored in a database server where versatile data management software is capable of processing the results and outputting reports according to user need. Two-way communication via a LAN connection is also possible.
· Typical connectivity
Provides top and bottom views of surface particles
Views can be switched between a single objective microscope lens positioned above the reticle/mask surface and any one of the four positioned below. The upper lens provides x 440 magnification, while the four below provide x 220, x 440, x 880, and x 2200. These lenses provide direct views of particles on the upper or lower surface.
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Contamination map and view screen |
Reduce inspection errors using unique Signal Processing Method
HORIBA's exclusive signal processing is able to suppress false detection down to the 1.0 µm / 1.0 µm L and S level. Pseudo-detection is further minimized through the use of a low-pass filter, which enhances pattern discrimination. This is very effective in reducing false detection on dense patterns.
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