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 HOME >> Products & Support >> Semiconductor >> Reticle/Mask Particle Detection System PR-PD2HR
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PR-PD2HR
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Related Products

Reticle/Mask Particle Detection System

PR-PD2HR

Related Products

Particle Detection (PD Series)

Support of advanced masking processes thanks to an improved S/N ratio
Reticle/Mask Particle Detection System
 
PR-PD2HR
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• 0.35 µm sensitivity
• Multi-stage case capability
• Multi-size compatibility


Efficient particle detection/measurement based on 0.35 µm high sensitivity and high throughput
Reticle/Mask Particle Detection System
 
PR-PD2
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• 0.35 µm sensitivity
• Multi-stage case capability
• Multi-size compatibility


Low running costs thanks to a compact design, plus remarkable versatility
Reticle/Mask Particle Detection System
 
PR-PD3
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• 0.5 µm sensitivity
• Single stage/single size
• Small footprint


Low-cost inspection with enhanced versatility and compactness
Reticle/Mask Particle Detection System (Desktop/Embedded type)
 
PR-PD5
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• Reticle inversion mechanism
• 0.5 to 50 µm selectability
• Single detection system
• Built-in and combination types


Detection of masks up to the sizes used on 7.5th generation lines
FPD Mask Particle Detection System
PR-PD4
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• 0.5/0.8 µm sensitivity
• Vertical mask positioning


Particle Removal

Removal of particles using blow and vacuum suction
Automatic Particle Blower
RP-1
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• Removal of particles from the pellicle and glass surfaces on pattern sides
• Use of N2 blow and vacuum suction to prevent the escape of removed particles


Foreign Particles & HAZE

The first step in preventing HAZE and foreign particle generation
Trace Ammonia Gas Monitor
 
CG-1000
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• Ultra-high sensitivity of 0.1 ppb
• Real-time measurement (every 5 sec.)
• Straightforward operation


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