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Reticle/Mask Particle Detection System
PR-PD3
Compact, Low Operating Cost, and Wide Ranging
Applications
Outline
Featuring a high net working rate and stability
over the long term, the HORIBA PD Series has attained a solid reputation
in semiconductor fabrication plants. Redesigned in a compact package,
the PR-PD3 inherits high-performance features such as a simple conveyance
system for stable long-term operation, high throughput, reliable
optics, and the ability to counter erroneous detection. While attaining
a compactness approximately one half its predecessor, the PR-PD2,
it also boasts low running cost.
With a detection sensitivity of 0.5 µm, it is very versatile.
The new PR-PD3 offers simplicity and yet meets wide ranging needs
in applications involving the measurement of particles on reticles
and masks.
Main Features
Compact design 1/2 of predecessor
The compact design boasts a footprint one half that of the PR-PD2.
Taking up much less space, the PR-PD3 can be arranged freely, even
with the addition of an operation unit (option).
Low maintenance and operating costs
Maintenance and operating costs have been reduced by using a highly
economical He-Ne laser and simply designed inspection loader/stage
unit.
Effective function for countering erroneous detection
The PR-PD3 is equipped with both a polarized differential function
for coarse patterns and a low-pass difference function for fine
patterns. Utilizing these two methods, erroneous detection can be
effectively countered in OPC patterns, etc., that possess both characteristics.
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