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 HOME >> Products & Support >> Semiconductor >> Reticle/Mask Particle Detection System PR-PD5
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PR-PD5
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Reticle/Mask Particle Detection System

PR-PD5

Compact, Low Operating Cost, and Wide Ranging Applications


Outline

Low-cost inspection with enhanced versatility and compactness

As well as inheriting the PD series' high efficiency, the PR-PD5 offers outstanding cost performance thanks to its space-saving design. This model can also be integrated with reticle stockers/steppers and cleaning equipment, etc.

• Reticle inversion mechanism
• 0.5 to 50 µm selectability
• Single detection system
• Built-in and combination types

Main Features

Low maintenance and operating costs
Maintenance and operating costs have been reduced by using a highly economical He-Ne laser and simply designed inspection loader/stage unit.

Effective function for countering erroneous detection
The PR-PD5 is equipped with both a polarized differential function for coarse patterns and a low-pass difference function for fine patterns. Utilizing these two methods, erroneous detection can be effectively countered in OPC patterns, etc., that possess both characteristics.

Highly versatile for diverse applications
Detecting particles on patterns with a sensitivity of 0.5 µm, the PR-PD5 not only detects particles on reticles and masks, but also measures them on the glass and pellicle surfaces with high throughput.

Advanced features for effective particle inspection
• Automatic coordinate compensation function
Three transmissive photoelectric sensors detect reticle edges. Positional deviation of the reticle on the fork is automatically corrected. Displayed results are always based on coordinates taken from the reticle edges.

• Leading-edge, multifunction software
HORIBA’s own multifunction software is used, which features pattern masking, foreign particle marking, and database management functions.

• Various reports can be output using the data management function.

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