Repeatability:

± 0.1 nm at 10 nm SiO₂ NIST

± 0.25 nm at 50 nm SiO₂ NIST

± 0.25 nm at 100 nm SiO₂ NIST

± 0.15 percent at 200 nm SiO₂ NIST

Wavelength:

Standard spec: 248 to 830 nm

Option spec: 190 to 830 nm

Light source:

Xe lamp

Sample stage

Wafer size;

Standard wafer size: 300 mm and 200 mm

Option wafer size: 5 inch, 6 inch

Stage resolution;

Less than 1 µm

Multichannel:

Standard: 16 ch

Option: 32 ch, 64 ch,

Pattern recognition:

Standard

Auto focus:

Standard

Communication:

Option (SECS2, GEM)

Option (CIM, AGV)

Utility of power:

Standard:

200 V AC ± 10 percent, 3 KVA,

50 and 60 Hz ± 1 percent

Option:

208, 220, 230, 240 V AC

Utility of vacuum,
pressure air and gas:

Vacuum: 20 ± 5 Kpa (flow rate: depends on stage spec)

Air: 0.5 ± 0.05 Mpa (flow rate: depends on robot spec)

N₂: approx. 4 L/min

Exhaust:

Diameter of duct: 100 mm

Flow rate: 50 m³ /hour